MILMAN THIN FILM SYSTEMS PVT. LTD.
MILMAN THIN FILM SYSTEMS PVT. LTD.
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MAIN FEATURES:
  • Three 3” / 4” / 6” magnetron sputtering cathodes.
  • Choice of dc, pulsed dc and/or rf sputtering.
  • Substrate rotation to give high uniformity.
  • Quartz ir lamp based substrate heater control.
  • PLC-PC based automation for complete process control
  • Substrate bias capability (optional).
  • Cathodes can be in confocal geometry
  • Available with or without load lock facility.
  • All safety interlocks for operator’s safety.