MILMAN THIN FILM SYSTEMS PVT. LTD.
MILMAN THIN FILM SYSTEMS PVT. LTD.
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Lab Systems for R & D
  • Provides common platform for thermal evaporation and electron beam evaporation with indexable four sources
  • All stainless steel (ss304) construction of vacuum chamber valves and plumbing lines along with all viton© o'rings and seals
  • State of the art quartz ir lamp based substrate heating mechanism
  • Plc-pc based automation for complete process control
  • Glow discharge plasma cleaning facility for precleaning of substrates
  • All interlocks for cooling water, low vacuum, compressed air failure etc. for safe operation
 
  • Option of 3” / 4” magnetron sputtering cathode*
  • Quartz infra red lamp based substrate heater and rotation facility.
  • Substrate bias capability (optional).
  • Flexibility of manual, semiautomatic or complete plc based automation.
  • User friendly controls with active mimic displays for vacuum status.
 
  • Choice of dc, pulsed dc and/or rf sputtering.
  • Substrate rotation to give high uniformity.
  • Quartz ir lamp based substrate heater control.
  • PLC-PC based automation for complete process control
 
  • Anodized aluminium based planar electrode assembly for uniform gas flow dynamics
  • Interchangable substrate holder assembly to accommodate various substrate sizes
 
  • Controlled process at 1200°c.
  • Ramp rates of 220°c/sec.
  • Temperature uniformity over wafer surface within ± 2%.