MILMAN THIN FILM SYSTEMS PVT. LTD.
MILMAN THIN FILM SYSTEMS PVT. LTD.
Home    Plasma Ion Nitriding Equipment

 

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MAIN FEATURES:
 
  • Process chamber with thermal insulation and cooling facility
  • Novel hot retort design to enhance heat transfer and lower heat losses
  • Three zone heating with independent PID control provides excellent thermal uniformity
  • PLC / PC based control with SCADA package to provide recipe storage, recall for process repeatability.
  • Closed loop PID based pressure control with capacitance manometer and motorized valve.
  • Precision mass flow controllers provide precise control over gas phase chemistry and process.
  • Pulsed dc power supply with advanced arc management and setting of pulse frequency and duty cycle
  • Online fine temperature control by interactive duty cycle control during nitriding
  • Integration of dual process chamber to enhance productivity (optional).
  • PIN equipment for process chamber up to 900º C available on request