Mini PVD Station

MAIN FEATURES

• Compact standalone table top model
• Universal platform to provide for
  1. Magnetron Sputtering Technology
  2.  Thermal and E-Beam Evaporation
  3.  Plasma Enhanced Chemical Vapor Deposition
  4.  Reactive Ion Etching
  5.  Plasma Ashing
  6.  Plasma Surface Activation
•  Single equipment with many PVD technologies
•  Swift switch over between different configurations
•  Turbo molecular pump to provide fast and clean oil free high vacuum
•  User friendly front panel color LCD based touch screen HMI control
•  Plc based process automation with recipe management
•  Substrate heating facility up to 250°c along with rotation
•  Low footprint with universal single phase input power
•  Limited utilities requirement