MILMAN THIN FILM SYSTEMS PVT. LTD.
MILMAN THIN FILM SYSTEMS PVT. LTD.
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The equipment is designed to provide ultra-fast heating treatment to silicon wafer. The system is capable of very high power density illumination built using Tungsten Halogen lamps. In addition to heating system is provided with high vacuum facility along with gas injection system including number of gases.

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MAIN FEATURES:
  • Capability to reach 1100°C on silicon wafer
  • Temperature ramp rates of 150°C/sec
  • Optical sensor based temperature measurement for fast response and feedback
  • State of the art double walled SS chamber for hot zone with water cooling facility
  • Optimized crossed lamp array design to provide uniformity of illumination
  • Closed Loop PID mode (calibration mode) and intensity controlled mode operation
  • Safety interlocks for door and water flow
  • Use of "CE" certified major electrical and electronics parts
  • High reliability and low maintenance